ALD center Finland offers services with three groups of equipment:

1. ALD/ALEt reactors connected to analytical techniques for in situ and in vacuo studies on ALD/ALEt reaction mechanisms

2. ALD/ALEt reactors for testing precursors and developing processes

3. Thin film characterisation techniques

The surface analytical techniques implemented in 1. can be utilized in multiple ways also for research on e.g. heterogeneous catalysis as well as energy technology materials (batteries, solar cells etc.). Likewise, thin film characterisation methods can be exploited for all kinds of thin films regardless of their deposition method.

The infrastructure is open access for academic researchers and industry professionals in need of the facilities for research and product development. The access is equally open for national and international parties. Reasonable user fees will apply with the aim to cover part of the running costs and to ensure most efficient usage of the infrastructure. Fees are defined separately to each equipment and they are lower for public researchers than for companies.