ALD center Finland is a national, centralized open access platform for research and education in atomic layer level materials processing techniques of Atomic Layer Deposition (ALD) and Atomic Layer Etching (ALEt). The center also serves as a valuable resource to other fields of research that require state-of-the-art techniques for thin film characterization and resolving surface chemistry. ALD center Finland welcomes researchers also widely beyond the ALD/ALEt community.
ALD center Finland offers services with three groups of equipment: ALD/ALEt reactors connected to analytical techniques for in situ and in vacuo studies on the reaction mechanisms; ALD/ALEt reactors for testing precursors and developing processes; Thin film characterization techniques. Learn more.
We provide services in multiple different ways: measurement services, collaborative research, and access to infrastructure. To start using ALD center Finland resources please prepare a compact free-from application where you explain your research case and expected needs from ALD center, and submit that to firstname.lastname@example.org. Your application will be evaluated by the steering group and feedback reported to you in a week.
ALD center Finland is formed by HelsinkiALD, Helsinki Accelerator Laboratory, and X-ray laboratory at the University of Helsinki. Find out more about us through our home pages.