HelsinkiALD - a unique combination of basic research and industrial collaboration
The HelsinkiALD group is doing research in the field of inorganic materials chemistry. Our main research topic is thin films and Atomic Layer Deposition (ALD) but also other methods for thin film deposition and nanostructure preparation are studied. After starting in 1991, our group has become a worldwide leader in developing new ALD chemistries. The largest emphasis in our ALD research is on thin film materials needed in future generation integrated circuits. In addition, applications of ALD in energy technologies, optics, surface engineering and biomaterials are being studied by our group.