HelsinkiALD - a unique combination of basic research and industrial collaboration

The HelsinkiALD group, led by Professor Mikko Ritala and Associate professor Matti Putkonen, is doing research in the field of inorganic materials chemistry. Our main research topic is thin films and Atomic Layer Deposition (ALD) but also other methods for thin film deposition and nanostructure preparation are studied. After starting in 1991, our group has become a worldwide leader in developing new ALD chemistries. The largest emphasis in our ALD research is on thin film materials needed in future generation integrated circuits. In addition, applications of ALD in energy technologies, optics, surface engineering and biomaterials are being studied by our group.
@HelsinkiALD

Early Christmas visit of Santa to #HelsinkiALD. Delivery of XPS and UHV part of our new #ALDep cluster tool arrived… twitter.com/i/web/status/1…

ALD center Finland (@HelsinkiALD, @helixsfi and UH accelerator laboratory) selected to Finland’s national research… twitter.com/i/web/status/1…

Welcome to a virtual visit to our lab! For a more authentic experience, mute the video and play Eye of the Tiger i… twitter.com/i/web/status/1…

HelsinkiALD well represented in these stats: atomiclimits.com/2020/10/05/aut… https://t.co/4lqLGNvGAW