Below you can find the list of some of our representative publications and also the newest in decending order.
Representative publications
- Juha Ojala, Pekka Pykäläinen, Mykhailo Chundak, Anton Vihervaara, Marko Vehkamäki and Mikko Ritala
Atomic Layer Etching of Tantalum with NbCl₅ and O₂, Chemistry of Materials, 2025, 37, 10, 3822.
- Valtteri Lasonen, Anton Vihervaara, Georgi Popov, Eva Tois, Lars Mester, Mohammad Karimi, Yoana Ilarionova, Reza Jafari Jam, Jonas Sundqvist and Mikko Ritala
Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decomposition, Chemistry of Materials, 2023, 35, 6097.
- Heta-Elisa Nieminen, Mykhailo Chundak, Mikko J. Heikkilä, Paloma Ruiz Kärkkäinen, Marko Vehkamäki, Matti Putkonen and Mikko Ritala
In vacuo cluster tool for studying reaction mechanisms in atomic layer deposition and atomic layer etching processes, Jounal of Vacuum Science and Technology A, 2023, 41, 022401.
- Saba Ghafourisaleh, Marko Vehkamäki, Anton Vihervaara, Chao Zhang, Mikko J. Heikkilä, Markku Leskelä, Matti Putkonen and Mikko Ritala
Molecular Layer Deposition of Pyrrone Thin Films by Oxidative Polymerization, Advanced Materials Interfaces, 2023, 10, 2202174.
- Chao Zhang, Eva Tois, Markku Leskelä and Mikko Ritala
Substrate-Dependent Area-Selective Atomic Layer Deposition of Noble Metals from Metal β-Diketonate Precursors, Chemistry of Materials, 2022, 34, 18, 8379.
- Esko Kokkonen, Mikko Kaipio, Heta-Elisa Nieminen, Foqia Rehman, Ville Miikkulainen, Matti Putkonen, Mikko Ritala, Sami Huotari, Joachim Schnadt and Samuli Urpelainen
Ambient pressure x-ray photoelectron spectroscopy setup for synchrotron-based in situ and operando atomic layer deposition research, Review of Scientific Instruments, 2022, 93, 013905.
- Alexander Weiß, Georgi Popov, Elisa Atosuo, Anton Vihervaara, Pasi Jalkanen, Marko Vehkamäki, Markku Leskelä, Mikko Ritala and Marianna Kemell
Atomic Layer Deposition of CsI and CsPbI₃, Chemistry of Materials, 2022, 34, 6087.
- Antti-Jussi, Kallio, Alexander Weiß, René Bes, Mikko J. Heikkilä, Marianna Kemell, Mikko Ritala and Simo Huotari
Laboratory-scale X-ray absorption spectroscopy of 3d transition metals in inorganic thin films, Dalton Transactions, 2022, 51, 18593.
- Varun Sharma, Simon D. Elliott, Tom Blomberg, Suvi Haukka, Michael E. Givens, Marko Tuominen and Mikko Ritala
Thermal Atomic Layer Etching of Aluminum Oxide (Al₂O₃) Using Sequential Exposures of Niobium Pentafluoride (NbF₅) and Carbon Tetrachloride (CCl₄): A Combined Experimental and Density Functional Theory Study of the Etch Mechanism, Chemistry of Materials, 2021, 33, 8, 2883.
- Miika Mattinen, Georgi Popov, Marko Vehkamäki, Peter J. King, Kenichiro Mizohata, Pasi Jalkanen, Jyrki Räisänen, Markku Leskelä and Mikko Ritala
Atomic Layer Deposition of Emerging 2D Semiconductors HfS₂ and ZrS₂ for Optoelectronics, Chemistry of Materials, 2019, 31, 5713.
- Timo Hatanpää, Mikko Ritala and Markku Leskelä
Precursors as Enablers of ALD Technology: Contibutions from University of Helsinki, Coordination Chemistry Reviews, 2013, 257, 3297.
- Kjell Knapas and Mikko Ritala
In Situ Studies on Reaction Mechanisms in Atomic Layer Deposition, Critical Reviews in Solid State and Materials Sciences, 2013, 38, 167.
- Viljami Pore, Timo Hatanpää, Mikko Ritala and Markku Leskelä
Atomic Layer Deposition of Metal Tellurides and Selenides Using Alkylsilyl Compounds of Tellurium and Selenium, Journal of the American Chemical Society, 2009, 131, 3478.
- Mikko Ritala, Kaupo Kukli, Antti Rahtu, Petri I. Räisänen, Markku Leskelä, Timo Sajavaara and Juhani Keinonen
Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources, Science, 2000, 288, 319.