Below you can find the list of some of our representative publications and also the newest in decending order.
Representative publications
- Mikko Ritala, Kaupo Kukli, Antti Rahtu, Petri I. Räisänen, Markku Leskelä, Timo Sajavaara and Juhani Keinonen
Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources, Science, 2000, 288, 319.
- Viljami Pore, Timo Hatanpää, Mikko Ritala and Markku Leskelä
Atomic Layer Deposition of Metal Tellurides and Selenides Using Alkylsilyl Compounds of Tellurium and Selenium, Journal of the American Chemical Society, 2009, 131, 3478
- Elina Färm, Seppo Lindroos, Mikko Ritala and Markku Leskelä
Microcontact Printed RuOx Films as an Activation Layer for Selective-Area Atomic Layer Deposition of Ruthenium, Chemistry of Materials, 2012, 24, 275.
- Kjell Knapas and Mikko Ritala
In Situ Studies on Reaction Mechanisms in Atomic Layer Deposition, Critical Reviews in Solid State and Materials Sciences, 2013, 38, 167.
- Timo Hatanpää, Mikko Ritala and Markku Leskelä
Precursors as Enablers of ALD Technology: Contibutions from University of Helsinki, Coordination Chemistry Reviews, 2013, 257, 3297.
- Miia Mäntymäki, Jani Hämäläinen, Esa Puukilainen, Timo Sajavaara, Mikko Ritala and Markku Leskelä
Atomic Layer Deposition of LiF Thin Films from Lithd, Mg(thd)2, and TiF4 Precursors, Chemistry of Materials, 2013, 25, 1656.
- Leo D. Salmi, Mikko Heikkilä, Marko Vehkamäki, Esa Puukilainen, Timo Sajavaara and Mikko Ritala
Studies on Atomic Layer Deposition of IRMOF-8 Thin Films, Journal of Vacuum Science and Technology A, 2015, 33, 01A121.
- Elisa Atosuo, Miia Mäntymäki, Kenichiro Mizohata, Mikko Heikkilä, Jyrki Räisänen, Mikko Ritala and Markku Leskelä
Preparation of Lithium Containing Oxides by Solid State Reaction of Atomic Layer Deposited Thin Films, Chemistry of Materials, 2017, 29, 998.
- Sanni Seppälä, Jaakko Niinistö, Timothee Blanquart, Mikko Kaipio, Kenichiro Mizohata, Jyrki Räisänen, Clement Lansalot-Matras, Wontae Noh, Mikko Ritala and Markku Leskelä
Heteroleptic Cyclopentadienyl-Amidinate Precursors for Atomic Layer Deposition (ALD) of Y, Pr, Gd, and Dy Oxide Thin Films, Chemistry of Materials, 2016, 28, 5440.
- Miika Mattinen, Georgi Popov, Marko Vehkamäki, Peter J. King, Kenichiro Mizohata, Pasi Jalkanen, Jyrki Räisänen, Markku Leskelä and Mikko Ritala
Atomic Layer Deposition of Emerging 2D Semiconductors HfS2 and ZrS2 for Optoelectronics, Chemistry of Materials, 2019, 31, 5713.
- Georgi Popov, Miika Mattinen, Timo Hatanpää, Marko Vehkamäki, Marianna Kemell, Kenichiro Mizohata, Jyrki Räisänen, Mikko Ritala and Markku Leskelä
Atomic Layer Deposition of PbI2 Thin Films, Chemistry of Materials, 2019, 31, 1101.
- Katja Väyrynen, Timo Hatanpää, Miika Mattinen, Kenichiro Mizohata, Kristoffer Meinander, Jyrki Räisänen, Joosep Link, Raivo Stern, Mikko Ritala and Markku Leskelä
Atomic Layer Deposition of Intermetallic Co3Sn2 and Ni3Sn2 Thin Films, Advanced Materials Interfaces, 2018, 5, 1801291.
- Jani Holopainen, Mikko J. Heikkilä, Leo D. Salmi, Kaisu Ainassaari and Mikko Ritala
Zeolitic Imidazole Framework-8 (ZIF-8) Fibers by Gas-phase Conversion of Electroblown Zinc Oxide and Aluminum Doped Zinc Oxide Fibers, Microporous & Mesoporous Materials, 2018, 267, 212.
- Jani Hämäläinen, Miika Mattinen, Kenichiro Mizohata, Kristoffer Meinander, Marko Vehkamäki, Jyrki Räisänen, Mikko Ritala and Markku Leskelä
Atomic Layer Deposition of Rhenium Disulfide, Advanced Materials, 2018, 30, 1703622.
- Maarit Mäkelä, Timo Hatanpää, Kenichiro Mizohata, Jyrki Räisänen, Mikko Ritala and Markku Leskelä
Thermal Atomic Layer Deposition of Continuous and Highly Conducting Gold Thin Films, Chemistry of Materials, 2017, 29, 6130.
- Katja Väyrynen, Kenichiro Mizohata, Jyrki Räisänen, Daniel Peeters, Anjana Devi, Mikko Ritala and Markku Leskelä
Low-Temperature Atomic Layer Deposition of Low-Resistivity Copper Thin Films Using Cu(dmap)2 and Tertiary Butyl Hydrazine, Chemistry of Materials, 2017, 29, 6502.